The test principle of the water drop angle tester for the effect evaluation of the atmospheric plasma cleaner

• Categories:Company Dynamics
• Author:Plasma cleaning machine-CRF plasma plasma equipment-plasma surface treatment machine manufacturer-chengfeng intelligent manufacturing
• Origin:
• Time of issue:2021-11-27
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(Summary description)The test principle of the water drop angle tester for the effect evaluation of the atmospheric plasma cleaner: The water drop angle tester can effectively evaluate the effect of the surface treatment before and after the plasma cleaning of the atmospheric plasma cleaner. The water drop angle tester is a professional analytical instrument that uses distilled water as the detection liquid and uses the high sensitivity of water surface tension to evaluate the surface free energy of solid materials or the wetting angle of solid materials with water. In the semiconductor chip industry, especially in the wafer manufacturing process, the requirements for cleanliness are very high, and only the wafer meets the requirements can it be considered qualified. The water drop angle tester, as a test tool for evaluating the plasma cleaning effect of atmospheric plasma cleaners, is an effective tool for evaluating the quality of wafers. In recent years, China's wafer industry has developed rapidly. Therefore, there are higher requirements for the detection of wafer drop angles. According to the basic principle of the water drop angle test: the solid sample surface due to its own surface roughness, chemical diversity, heterogeneity and other factors, the contact angle value or water drop angle of the solid surface of the plasma cleaner shows left and right, front and back, and front and back. Inconsistent; therefore, the algorithm of the water drop angle measuring instrument must adopt the basic principle that conforms to the interface chemistry principle, and can realize one-key quick measurement. The technical requirements of the application for the test chip semiconductor: Since chip nanoscale processes, such as 12 or 7 nanometer processes, have various structures and directions, heterogeneity is particularly prominent in chip or wafer processes. At the same time, the water drop angle tester is also required to have functions such as shooting, screenshots, and optical cameras. The applicable physical properties of the water drop angle measuring instrument require that it can sensitively capture the small changes in the angle between the left and right, front and back of the droplet (try to be less than 1 ml, use an ultra-fine needle) in a small range due to poor cleaning effect. The size of the angle is obviously offset from the left and right angles, indicating that the surface of the sample has not been cleaned by an atmospheric plasma cleaning machine. On the whole, for wafer or wafer processing, in addition to testing the effect of the atmospheric plasma cleaner (Plasma), it is more important to evaluate the adhesion or surface free energy of the wafer under what conditions (especially Is the latter).