The function of plasma cleaning machine

• Categories:Industry News
• Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
• Origin:
• Time of issue:2021-01-15
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(Summary description)Plasma cleaning machine is a new high-tech technology, the use of plasma can achieve the traditional cleaner can not achieve the effect, such as used for material surface cleaning activation modification etching to improve hydrophilic bonding adhesion. Plasma is a form of matter, also called the fourth form of matter. Enough energy is acting on the gas to ionize it and leave it in a plasma state. The "active" components in plasma include ions, electrons, active groups, metastable stimulated nuclides, photons and so on. Plasma equipment is to use the characteristics of these active components to sample surface treatment, so as to achieve the purpose of cleaning. Plasma cleaning machine in the generation of plasma device, is the two electrodes in a sealed container to generate electric field, with a vacuum pump to achieve a certain vacuum degree. As the gas gets thinner, the distance between the molecules and the distance that the molecules or ions are free to travel increases. They collide under the action of positive and negative pole fields to form plasma. These ions have enough activity and energy to break almost any chemical bond, leading to any chemical reaction on the exposed surface. The plasma of various gases has different chemical properties. For example, oxygen plasma has high oxidation performance, can oxidize photoresist into gas, so as to achieve the purpose of cleaning. Corrosion gas plasma has good anisotropy and can meet the needs of corrosion. Glow is generated during plasma processing, so it is called glow discharge processing. The function of the plasma cleaning machine mainly depends on the "activation" of the active particles in the plasma to remove the surface stains of objects. In terms of mechanism, plasma cleaning generally includes the following processes: inorganic gas is excited to the plasma state; Solid surface adsorption of gas phase material; Adsorptive groups react with solid surface molecules to form product molecules; Analyze the product molecules to form the gas phase; The reaction residue is separated from the surface. Plasma cleaners are characterized by their ability to handle metals, semiconductors, oxides and most polymer materials, such as polypropylene, polyester, polyimide, PVC, epoxy resins, and even PTFE, regardless of the type of substrate being treated. It can also clean integral, partial and complex structures. The plasma cleaner can be done independently of the processing object. The product can handle a variety of materials, whether metal, semiconductor, oxide or polymer (such as polypropylene, polyvinyl chloride, polytetrafluoroethylene, polyimide, polyester, epoxy resin, etc.), can be treated by plasma. Therefore, it is especially suitable for materials that are not resistant to high temperature and solvent. It is also optional to carry out partial cleaning on whole, partial or complex structure of the material. After cleaning and decontamination is completed, the surface properties of the material itself will be improved. Such as improving the wettability of the surface, improve the adhesion of the film, in many applications are very important.