What are the factors affecting the coating uniformity of vacuum coating equipment

• Categories:Company Dynamics
• Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
• Origin:
• Time of issue:2021-01-13
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(Summary description)Vacuum coating is more complex, the uniformity of the thin film theory is: bao hou of symmetry can also understand for surface roughness on the limits of optical thin film (namely 1/10 light wavelength, about 100 a), vacuum coating proportions are very good, so the surface roughness can be easily controlled in visible wavelength of 1/10 category, in other words the vacuum technology strength is no problem for thin film coating. Unity on chemical composition: that is to say, in the film the chemicals of atoms is not large, easy to form the asymmetrical features, if the plating process is not reasonable, so the surface is not Sitio3, may be other chemical proportion, the plating is not ideal in the organic chemical composition, it is also a vacuum coating technology will encounter more difficult things. Lattice uniformity: this determines that the film is single crystal, polycrystal, amorphous, is a hot topic in vacuum electroplating technology. Vacuum deposition can be divided into two categories: evaporation deposition and sputtering deposition, including vacuum ion volatilization, magnetron sputtering, MBE molecular structure beam ductility, gel solution gel method, etc. The key to the uniformity of thin-thickness lies in: lattice matching degree of material and sputtering target, outer surface temperature, evaporation speed and power, vacuum degree, coating time and thickness degree. The symmetry of crystals is influenced by the following factors: lattice match, temperature, and rate of evaporation. For the sputtering coating, it can be simply understood as electronic devices or high-energy laser sputtering target material. The surface parts are splashed in the form of atomic clusters or ions and deposited on the surface of the substrate to produce thin films. Sputtering coatings are divided into several types, and the difference from evaporation coatings depending on the sputtering speed will become one of the main parameters. The composition of the film in the sputtering coating is easy to maintain, but the atomic uniformity is weak and the crystal direction control is general. The influencing factors are: target and substrate matching degree, low pressure coating atmosphere, substrate temperature, laser output power, pulse frequency, sputtering time. For sputtering and substrate of different materials, the appropriate parameters are not the same. The key to the quality of equipment is whether the temperature can be controlled, whether the vacuum value can be ensured, and whether the cleanliness of the vacuum chamber can be ensured. MBE molecular beam outer edge coating technology, this is a very good way to deal with this problem, the common coating equipment in industrial production is mainly ion evaporation coating and magnetron sputtering coating.