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What kinds of plasma cleaning

  • Categories:Company Dynamics
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2020-10-27
  • Views:

(Summary description)There are two main cleaning methods that have been widely used: wet method and dry method. Considering environmental impact, raw material consumption and future development, wet cleaning has great limitations, and dry cleaning is obviously superior to wet cleaning. Among them, plasma cleaning develops rapidly and has obvious advantages. A plasma is an ionized gas. It is a collection of electrons, ions, atoms, molecules, or free radicals. In the process of cleaning, high-energy electrons will collide with gas molecules to dissociate or ionize them. A variety of particles generated will be used to bombate the cleaned surface or chemically react with the cleaned surface to effectively remove various pollutants. At the same time, it can also improve the surface performance of the material itself, such as improving the wettability of the surface, improving the adhesion of the film, etc., which is of great significance in many applications.   After plasma cleaning, the surface of the device is dried and no further treatment is required, which can improve the processing efficiency of the whole process line. It can prevent the operator from being hurt by harmful solvent. The plasma can be cleaned deep into the small holes and depressions inside the object, so the shape of the object to be cleaned does not need to be considered too much. It can also handle all kinds of materials, especially for high temperature and solvent resistant materials. All these advantages make plasma cleaning widely concerned.   There are several kinds of plasma cleaning, mainly divided into chemical, physical and physical chemistry. For different cleaning objects, process gases such as O2, H2 and Ar can be selected for surface treatment.   1. Chemical reaction cleaning: Chemical reactions are carried out with highly active free radicals in plasma and organic substances on the surface of the material, also known as PE. Clean with oxygen to convert non-volatile organic compounds into volatile substances to produce carbon dioxide, carbon monoxide and water. It has the advantages of fast cleaning speed and better cleaning effect on organic pollutants. Its main disadvantage is that oxides can be reformed on the material surface. Oxide production is undesirable when lead bonding is used, but these disadvantages can be avoided by selecting proper process parameters.   2. Physical reaction cleaning: The atoms attached to the surface of the material are broken down by pure physical collisions with ions in the plasma, also known as sputtering corrosion (SPE). When cleaned with argon, the argon ions have enough energy to bombard the surface with enough force to remove any dirt. The macromolecules in the polymer were separated into small molecules by chemical bonds and evaporated by vacuum pump. During argon plasma cleaning, the microstructure of the material surface can be changed to make the material more "rough" at the molecular level, thus greatly improving its surface activity and binding performance. The advantage of argon plasma is that no oxide is left on the surface of the material. The disadvantages are excessive corrosion or reconcentration of pollutant particles in other undesirable areas, but these disadvantages can be controlled by adjusting process parameters.   3. Simultaneous cleaning of physical and chemical reactions: Both physical and chemical reactions play an important role in the reaction. For example, using Ar and O2 mixed gas online plasma cleaning process, the reaction rate is faster than using Ar and O2 alone. After argon ion acceleration, the kinetic energy generated can enhance the reaction capacity of oxygen ion, so physical and chemical methods can be used to clean the surface of heavily polluted material.

What kinds of plasma cleaning

(Summary description)There are two main cleaning methods that have been widely used: wet method and dry method. Considering environmental impact, raw material consumption and future development, wet cleaning has great limitations, and dry cleaning is obviously superior to wet cleaning. Among them, plasma cleaning develops rapidly and has obvious advantages. A plasma is an ionized gas. It is a collection of electrons, ions, atoms, molecules, or free radicals. In the process of cleaning, high-energy electrons will collide with gas molecules to dissociate or ionize them. A variety of particles generated will be used to bombate the cleaned surface or chemically react with the cleaned surface to effectively remove various pollutants. At the same time, it can also improve the surface performance of the material itself, such as improving the wettability of the surface, improving the adhesion of the film, etc., which is of great significance in many applications.

 

After plasma cleaning, the surface of the device is dried and no further treatment is required, which can improve the processing efficiency of the whole process line. It can prevent the operator from being hurt by harmful solvent. The plasma can be cleaned deep into the small holes and depressions inside the object, so the shape of the object to be cleaned does not need to be considered too much. It can also handle all kinds of materials, especially for high temperature and solvent resistant materials. All these advantages make plasma cleaning widely concerned.

 

There are several kinds of plasma cleaning, mainly divided into chemical, physical and physical chemistry. For different cleaning objects, process gases such as O2, H2 and Ar can be selected for surface treatment.

 

1. Chemical reaction cleaning:

Chemical reactions are carried out with highly active free radicals in plasma and organic substances on the surface of the material, also known as PE. Clean with oxygen to convert non-volatile organic compounds into volatile substances to produce carbon dioxide, carbon monoxide and water. It has the advantages of fast cleaning speed and better cleaning effect on organic pollutants. Its main disadvantage is that oxides can be reformed on the material surface. Oxide production is undesirable when lead bonding is used, but these disadvantages can be avoided by selecting proper process parameters.

 

2. Physical reaction cleaning:

The atoms attached to the surface of the material are broken down by pure physical collisions with ions in the plasma, also known as sputtering corrosion (SPE). When cleaned with argon, the argon ions have enough energy to bombard the surface with enough force to remove any dirt. The macromolecules in the polymer were separated into small molecules by chemical bonds and evaporated by vacuum pump. During argon plasma cleaning, the microstructure of the material surface can be changed to make the material more "rough" at the molecular level, thus greatly improving its surface activity and binding performance. The advantage of argon plasma is that no oxide is left on the surface of the material. The disadvantages are excessive corrosion or reconcentration of pollutant particles in other undesirable areas, but these disadvantages can be controlled by adjusting process parameters.

 

3. Simultaneous cleaning of physical and chemical reactions:

Both physical and chemical reactions play an important role in the reaction. For example, using Ar and O2 mixed gas online plasma cleaning process, the reaction rate is faster than using Ar and O2 alone. After argon ion acceleration, the kinetic energy generated can enhance the reaction capacity of oxygen ion, so physical and chemical methods can be used to clean the surface of heavily polluted material.


  • Categories:Company Dynamics
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2020-10-27 09:38
  • Views:
Information

What kinds of plasma cleaning:

 

There are two main cleaning methods that have been widely used: wet method and dry method. Considering environmental impact, raw material consumption and future development, wet cleaning has great limitations, and dry cleaning is obviously superior to wet cleaning. Among them, plasma cleaning develops rapidly and has obvious advantages. A plasma is an ionized gas. It is a collection of electrons, ions, atoms, molecules, or free radicals. In the process of cleaning, high-energy electrons will collide with gas molecules to dissociate or ionize them. A variety of particles generated will be used to bombate the cleaned surface or chemically react with the cleaned surface to effectively remove various pollutants. At the same time, it can also improve the surface performance of the material itself, such as improving the wettability of the surface, improving the adhesion of the film, etc., which is of great significance in many applications.

 

After plasma cleaning, the surface of the device is dried and no further treatment is required, which can improve the processing efficiency of the whole process line. It can prevent the operator from being hurt by harmful solvent. The plasma can be cleaned deep into the small holes and depressions inside the object, so the shape of the object to be cleaned does not need to be considered too much. It can also handle all kinds of materials, especially for high temperature and solvent resistant materials. All these advantages make plasma cleaning widely concerned.

 

There are several kinds of plasma cleaning, mainly divided into chemical, physical and physical chemistry. For different cleaning objects, process gases such as O2, H2 and Ar can be selected for surface treatment.

 

1. Chemical reaction cleaning:

Chemical reactions are carried out with highly active free radicals in plasma and organic substances on the surface of the material, also known as PE. Clean with oxygen to convert non-volatile organic compounds into volatile substances to produce carbon dioxide, carbon monoxide and water. It has the advantages of fast cleaning speed and better cleaning effect on organic pollutants. Its main disadvantage is that oxides can be reformed on the material surface. Oxide production is undesirable when lead bonding is used, but these disadvantages can be avoided by selecting proper process parameters.

 

2. Physical reaction cleaning:

The atoms attached to the surface of the material are broken down by pure physical collisions with ions in the plasma, also known as sputtering corrosion (SPE). When cleaned with argon, the argon ions have enough energy to bombard the surface with enough force to remove any dirt. The macromolecules in the polymer were separated into small molecules by chemical bonds and evaporated by vacuum pump. During argon plasma cleaning, the microstructure of the material surface can be changed to make the material more "rough" at the molecular level, thus greatly improving its surface activity and binding performance. The advantage of argon plasma is that no oxide is left on the surface of the material. The disadvantages are excessive corrosion or reconcentration of pollutant particles in other undesirable areas, but these disadvantages can be controlled by adjusting process parameters.

 

3. Simultaneous cleaning of physical and chemical reactions:

Both physical and chemical reactions play an important role in the reaction. For example, using Ar and O2 mixed gas online plasma cleaning process, the reaction rate is faster than using Ar and O2 alone. After argon ion acceleration, the kinetic energy generated can enhance the reaction capacity of oxygen ion, so physical and chemical methods can be used to clean the surface of heavily polluted material.

What kinds of plasma cleaning

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