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Introduction to cleaning principle of plasma cleaning machine

  • Categories:Company Dynamics
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2020-10-20
  • Views:

(Summary description)The principle of the plasma cleaning machine, mainly through the plasma acting on the surface of the material, cause a series of physical and chemical changes, the use of active particles and high-energy rays, and the surface organic pollutant molecules reaction, collision formation of small molecules volatile, removed from the surface, achieve the cleaning effect. Vacuum plasma cleaning machine is the use of rf power supply in the vacuum chamber to produce high-energy disordered plasma, under a certain pressure, the surface of the product plasma bombardment, so as to achieve the purpose of cleaning. Cleaning and etching: For example, in the plasma cleaning machine cleaning gas is usually used oxygen, after accelerating the bombardment of electrons into oxygen ions, free radicals, strong oxidation. Pollutants on the surface of parts, such as grease, flux, photographic film, mold release agent, punch oil, etc., will be rapidly oxidized into carbon dioxide and water, and through the vacuum pump discharge, in order to achieve the purpose of cleaning the surface, improve the wetting and adhesion. After plasma treatment at low temperature, the properties of the material body will not be affected. Because plasma cleaning is carried out under high vacuum conditions, the various activated ions in the plasma have a great degree of freedom, and they have a strong permeability, which can be processed for complex structures, including thin tubes and blind holes. Introduction of functional groups: By using N2, NH3, O2 and SO2 plasma to treat the polymer material, the chemical structure of the surface can be changed, so as to introduce the corresponding functional groups: -NH2, -OH, -COOH, -SO3H, etc. Such functional functional groups, such as polyethylene, polypropylene, polystyrene, polytetrafluoroethylene, etc., can be transformed into functional group materials with improved surface polarity, wettability, adhesiveness and reactivity, greatly increasing their application value. By low temperature plasma treatment of fluorine-containing gases, fluorine atoms can be introduced into the substrate surface, thus making the substrate hydrophobic, as opposed to oxygen plasma. Aggregation: Many vinyl monomers, such as ethylene, styrene, etc., can be under the condition of the plasma, without other catalyst and initiator, it can implement polymerization on the surface of workpiece, even in the conventional polymerization conditions cannot polymerization of methane, ethane, benzene, etc., can also be used under the condition of the plasma cleaning machine to clean the surface polymerization. The polymer layer can achieve the effect of being very dense and tightly bound to the matrix material.

Introduction to cleaning principle of plasma cleaning machine

(Summary description)The principle of the plasma cleaning machine, mainly through the plasma acting on the surface of the material, cause a series of physical and chemical changes, the use of active particles and high-energy rays, and the surface organic pollutant molecules reaction, collision formation of small molecules volatile, removed from the surface, achieve the cleaning effect. Vacuum plasma cleaning machine is the use of rf power supply in the vacuum chamber to produce high-energy disordered plasma, under a certain pressure, the surface of the product plasma bombardment, so as to achieve the purpose of cleaning.

Cleaning and etching:

For example, in the plasma cleaning machine cleaning gas is usually used oxygen, after accelerating the bombardment of electrons into oxygen ions, free radicals, strong oxidation. Pollutants on the surface of parts, such as grease, flux, photographic film, mold release agent, punch oil, etc., will be rapidly oxidized into carbon dioxide and water, and through the vacuum pump discharge, in order to achieve the purpose of cleaning the surface, improve the wetting and adhesion. After plasma treatment at low temperature, the properties of the material body will not be affected. Because plasma cleaning is carried out under high vacuum conditions, the various activated ions in the plasma have a great degree of freedom, and they have a strong permeability, which can be processed for complex structures, including thin tubes and blind holes.

Introduction of functional groups:

By using N2, NH3, O2 and SO2 plasma to treat the polymer material, the chemical structure of the surface can be changed, so as to introduce the corresponding functional groups: -NH2, -OH, -COOH, -SO3H, etc. Such functional functional groups, such as polyethylene, polypropylene, polystyrene, polytetrafluoroethylene, etc., can be transformed into functional group materials with improved surface polarity, wettability, adhesiveness and reactivity, greatly increasing their application value. By low temperature plasma treatment of fluorine-containing gases, fluorine atoms can be introduced into the substrate surface, thus making the substrate hydrophobic, as opposed to oxygen plasma.

Aggregation:

Many vinyl monomers, such as ethylene, styrene, etc., can be under the condition of the plasma, without other catalyst and initiator, it can implement polymerization on the surface of workpiece, even in the conventional polymerization conditions cannot polymerization of methane, ethane, benzene, etc., can also be used under the condition of the plasma cleaning machine to clean the surface polymerization. The polymer layer can achieve the effect of being very dense and tightly bound to the matrix material.


  • Categories:Company Dynamics
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2020-10-20 09:11
  • Views:
Information

Introduction to cleaning principle of plasma cleaning machine:

The principle of the plasma cleaning machine, mainly through the plasma acting on the surface of the material, cause a series of physical and chemical changes, the use of active particles and high-energy rays, and the surface organic pollutant molecules reaction, collision formation of small molecules volatile, removed from the surface, achieve the cleaning effect. Vacuum plasma cleaning machine is the use of rf power supply in the vacuum chamber to produce high-energy disordered plasma, under a certain pressure, the surface of the product plasma bombardment, so as to achieve the purpose of cleaning.

Cleaning and etching:

For example, in the plasma cleaning machine cleaning gas is usually used oxygen, after accelerating the bombardment of electrons into oxygen ions, free radicals, strong oxidation. Pollutants on the surface of parts, such as grease, flux, photographic film, mold release agent, punch oil, etc., will be rapidly oxidized into carbon dioxide and water, and through the vacuum pump discharge, in order to achieve the purpose of cleaning the surface, improve the wetting and adhesion. After plasma treatment at low temperature, the properties of the material body will not be affected. Because plasma cleaning is carried out under high vacuum conditions, the various activated ions in the plasma have a great degree of freedom, and they have a strong permeability, which can be processed for complex structures, including thin tubes and blind holes.

Introduction of functional groups:

By using N2, NH3, O2 and SO2 plasma to treat the polymer material, the chemical structure of the surface can be changed, so as to introduce the corresponding functional groups: -NH2, -OH, -COOH, -SO3H, etc. Such functional functional groups, such as polyethylene, polypropylene, polystyrene, polytetrafluoroethylene, etc., can be transformed into functional group materials with improved surface polarity, wettability, adhesiveness and reactivity, greatly increasing their application value. By low temperature plasma treatment of fluorine-containing gases, fluorine atoms can be introduced into the substrate surface, thus making the substrate hydrophobic, as opposed to oxygen plasma.

Aggregation:

Many vinyl monomers, such as ethylene, styrene, etc., can be under the condition of the plasma, without other catalyst and initiator, it can implement polymerization on the surface of workpiece, even in the conventional polymerization conditions cannot polymerization of methane, ethane, benzene, etc., can also be used under the condition of the plasma cleaning machine to clean the surface polymerization. The polymer layer can achieve the effect of being very dense and tightly bound to the matrix material.

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