Principle and composition of vacuum plasma cleaning machine

• Categories:Industry News
• Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
• Origin:
• Time of issue:2020-10-10
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(Summary description)Vacuum plasma cleaning machine is composed of vacuum generation system, electrical control system, plasma generator, vacuum chamber and related machinery. The vacuum plasma cleaning machine can be customized according to the requirements of customers. Vacuum plasma cleaning machine USES two electrodes to form electromagnetic field, vacuum pump to achieve effective vacuum degree, as the gas is more and more thin, the distance between molecules and molecules or ions free movement distance is also more and more long, the impact of magnetic field and the formation of plasma and produce glow. The plasma moves in space within the electromagnetic field and bombards the surface of the treated object continuously to remove surface oil, surface oxides, ashing surface organics and other chemicals, so as to achieve the effect of surface treatment cleaning and etching. Vacuum ion cleaning machine is widely used in surface decontamination and plasma etching and teflon (PTFE) and the mixture of PTFE etching, plastic, glass, ceramic surface activation and cleaning, such as plasma plating, polymerization process, therefore widely used in automobile industry, electronics, military electronics, PCB industry made high precision. The whole cleaning process of vacuum plasma cleaning machine is roughly as follows: 1. First, feed the cleaned workpiece into the vacuum machine and fix it, start the operating device and start exhaust, so that the vacuum degree in the vacuum chamber can reach the standard vacuum degree of about 10Pa. The average exhaust time is about a few minutes. 2. Then introduce the gas used for plasma cleaning into the vacuum chamber, and keep the pressure in the chamber stable. According to the different cleaning materials, oxygen, argon, hydrogen, nitrogen, carbon tetrafluoride and other gases can be used respectively. 3, indoor vacuum high-frequency voltage applied between the electrode and the grounding device, make the gas be breakdown and occurred by glow discharge plasma ionization and, let the plasma generated in a vacuum chamber in processed workpiece and start cleaning, washing processing last a few seconds to tens of minutes, according to different processing of materials. 4. After the cleaning, cut off the power supply, and pump out the gas and gasified dirt through vacuum pump, and the cleaning is finished. Vacuum plasma cleaning machine has many advantages: such as the use of numerical control technology automation degree; With high precision control device, high time control precision; Correct plasma cleaning will not produce damage layer on the surface, so the surface quality can be guaranteed. The cleaning work is carried out in a vacuum environment. The cleaning process is environmentally safe and does not pollute the environment, and the cleaning surface is effectively guaranteed not to be contaminated by secondary pollution.