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The application of graphene in integrated circuit is introduced in Plasma cleaning machine

  • Categories:Industry News
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2021-04-09
  • Views:

(Summary description)It is no exaggeration to say that graphene is the star material of the 21st century. In 2004, the discovery of graphene overthrew the two-dimensional structure "thermodynamic fluctuation at a finite temperature are not allowed to two-dimensional crystal under free existence" of cognition, shocked the whole physics, its discoverer, department of physics and astronomy at the university of Manchester, England Geim and Novoselov have therefore won the nomination of the Nobel Prize for physics in 2008, and won the 2010 Nobel Prize for physics. Compared with silicon, graphene has unique advantages in integrated circuits. Silicon-based microcomputer processors can only perform a certain number of operations per second at room temperature, but electrons pass through graphene with almost no resistance and generate very little heat. In addition, graphene itself is a good heat conductor and can dissipate heat very quickly. Because of its excellent properties, graphene can be used to make electronic products at much faster speeds. Speed is just one advantage of graphene. Silicon cannot be cut into pieces smaller than 10nm, or it will lose its attractive electronic properties. Compared to silicon, graphene's basic physical properties do not change when it is partitioned, and its electronic properties may even behave differently. As a result, graphene, which is smaller than silicon, can continue to maintain Moore's law when silicon is no longer separable, and thus has the potential to be a silicon replacement to drive microelectronics forward. Therefore, the unique physical and chemical properties of graphene also arouse the great interest of scientists in the fields of physics, chemistry and materials. The above is the introduction of graphene in the integrated circuit of CRF plasma cleaning machine manufacturers.

The application of graphene in integrated circuit is introduced in Plasma cleaning machine

(Summary description)It is no exaggeration to say that graphene is the star material of the 21st century. In 2004, the discovery of graphene overthrew the two-dimensional structure "thermodynamic fluctuation at a finite temperature are not allowed to two-dimensional crystal under free existence" of cognition, shocked the whole physics, its discoverer, department of physics and astronomy at the university of Manchester, England Geim and Novoselov have therefore won the nomination of the Nobel Prize for physics in 2008, and won the 2010 Nobel Prize for physics. Compared with silicon, graphene has unique advantages in integrated circuits.


Silicon-based microcomputer processors can only perform a certain number of operations per second at room temperature, but electrons pass through graphene with almost no resistance and generate very little heat. In addition, graphene itself is a good heat conductor and can dissipate heat very quickly. Because of its excellent properties, graphene can be used to make electronic products at much faster speeds. Speed is just one advantage of graphene. Silicon cannot be cut into pieces smaller than 10nm, or it will lose its attractive electronic properties. Compared to silicon, graphene's basic physical properties do not change when it is partitioned, and its electronic properties may even behave differently. As a result, graphene, which is smaller than silicon, can continue to maintain Moore's law when silicon is no longer separable, and thus has the potential to be a silicon replacement to drive microelectronics forward. Therefore, the unique physical and chemical properties of graphene also arouse the great interest of scientists in the fields of physics, chemistry and materials.


The above is the introduction of graphene in the integrated circuit of CRF plasma cleaning machine manufacturers.

  • Categories:Industry News
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2021-04-09 09:37
  • Views:
Information

The application of graphene in integrated circuit is introduced in Plasma cleaning machine:
It is no exaggeration to say that graphene is the star material of the 21st century. In 2004, the discovery of graphene overthrew the two-dimensional structure "thermodynamic fluctuation at a finite temperature are not allowed to two-dimensional crystal under free existence" of cognition, shocked the whole physics, its discoverer, department of physics and astronomy at the university of Manchester, England Geim and Novoselov have therefore won the nomination of the Nobel Prize for physics in 2008, and won the 2010 Nobel Prize for physics. Compared with silicon, graphene has unique advantages in integrated circuits.

CRF Plasma cleaning
Silicon-based microcomputer processors can only perform a certain number of operations per second at room temperature, but electrons pass through graphene with almost no resistance and generate very little heat. In addition, graphene itself is a good heat conductor and can dissipate heat very quickly. Because of its excellent properties, graphene can be used to make electronic products at much faster speeds. Speed is just one advantage of graphene. Silicon cannot be cut into pieces smaller than 10nm, or it will lose its attractive electronic properties. Compared to silicon, graphene's basic physical properties do not change when it is partitioned, and its electronic properties may even behave differently. As a result, graphene, which is smaller than silicon, can continue to maintain Moore's law when silicon is no longer separable, and thus has the potential to be a silicon replacement to drive microelectronics forward. Therefore, the unique physical and chemical properties of graphene also arouse the great interest of scientists in the fields of physics, chemistry and materials.


The above is the introduction of graphene in the integrated circuit of CRF plasma cleaning machine manufacturers.

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