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Research on the application of low temperature plasma radical chemical reaction in polysilicon industry
- Categories:Industry News
- Author:Plasma cleaning machine-CRF plasma plasma equipment-plasma surface treatment machine manufacturer-chengfeng intelligent manufacturing
- Origin:
- Time of issue:2022-03-08
- Views:
(Summary description)Research on the application of low temperature plasma radical chemical reaction in polysilicon industry: A chemical reaction is a recombination at the level of atoms or groups of atoms, which requires the necessary activation energy for the reaction from the outside world. Compared with plasma, the reactants produced in industry are mostly in a dense condensed state. Most of the participating gases are dense layers of "high concentration", which makes it difficult to continuously transfer large excitation energy to the reaction system, and some chemical reactions that require extremely large activation energy are difficult to achieve under conventional technical conditions. There is a close connection between chemistry and physics. Microscopic forms such as electron movement, interatomic interaction force, and excitation and ionization of atoms and molecules in molecules determine the physicochemical properties and chemical reaction capabilities of substances. Therefore, applying physical methods to change the state of matter can lead to chemical changes or affect the progress of chemical reactions. For this reason, the electric field directly transfers energy to the gas molecules in the reaction chamber, generating electrons with sufficient energy to inelastically collide with the gas molecules, transferring almost all the energy of the electrons to the gas molecules participating in the reaction, so that a large number of photons are generated in the gas in the reaction chamber. , electrons, ions, free radicals and active atoms excited state atoms and active molecules provide extremely active active particles for their chemical reactions, thereby making many chemical reaction conditions milder and improving chemical reaction efficiency. In nature, substances exist in solid state, liquid state and gaseous state. Among them, solid particles are closely bound together, followed by liquid state, and gaseous state is dispersed. To achieve the transformation of substances from a dense to a dispersed aggregate state, it is necessary to provide additional energy to destroy the larger binding energy between the original particles. In the same way, when the substance is in a gaseous state, it continues to provide energy to form the ionization of the gaseous substance particles to form a plasma. The difference between a low temperature plasma and a high temperature plasma is the temperature of the ions and the ion channel. The electron motion temperature of low temperature plasma is as high as 10~10K, while the ion and neutral ion temperature of gas is close to the ambient temperature, which is much lower than the electron motion temperature. Therefore, low temperature plasma is also called non-equilibrium plasma. Low temperature plasma can be generated under normal temperature and pressure, and its industrial application prospect is broad. The test data shows that the power parameters have a great influence on the primary conversion rate of STC. The lower the power frequency and the higher the voltage within a certain range, the more conducive to the chlorosilane hydrogenation reaction. The low-temperature plasma generator generated by the power frequency through the DBD discharge method is safe, reliable, economical, environmentally friendly and easy to implement. For the promotion effect in the hydrogenation of silicon tetrachloride, the primary conversion efficiency of STC of more than 5% can be achieved by using plasma assistance under normal temperature and pressure conditions. Plasma contains a large number of photons, electrons, ions, free radicals, and active atomic excited state atomic excited state molecules and active molecules, etc., which provide extremely active active particles for chemical reactions, so that many usually cannot occur or require extremely harsh conditions to occur. The chemical reaction becomes easy to carry out at close to room temperature, which provides a new realization method for chemical reaction. For the polysilicon chemical industry, considering hydrogenation, vapor deposition and other processes in terms of energy consumption control and efficiency improvement, the use of plasma to promote the reaction process has great practical value and scientific research value.
Research on the application of low temperature plasma radical chemical reaction in polysilicon industry
(Summary description)Research on the application of low temperature plasma radical chemical reaction in polysilicon industry:
A chemical reaction is a recombination at the level of atoms or groups of atoms, which requires the necessary activation energy for the reaction from the outside world. Compared with plasma, the reactants produced in industry are mostly in a dense condensed state. Most of the participating gases are dense layers of "high concentration", which makes it difficult to continuously transfer large excitation energy to the reaction system, and some chemical reactions that require extremely large activation energy are difficult to achieve under conventional technical conditions.
There is a close connection between chemistry and physics. Microscopic forms such as electron movement, interatomic interaction force, and excitation and ionization of atoms and molecules in molecules determine the physicochemical properties and chemical reaction capabilities of substances. Therefore, applying physical methods to change the state of matter can lead to chemical changes or affect the progress of chemical reactions.
For this reason, the electric field directly transfers energy to the gas molecules in the reaction chamber, generating electrons with sufficient energy to inelastically collide with the gas molecules, transferring almost all the energy of the electrons to the gas molecules participating in the reaction, so that a large number of photons are generated in the gas in the reaction chamber. , electrons, ions, free radicals and active atoms excited state atoms and active molecules provide extremely active active particles for their chemical reactions, thereby making many chemical reaction conditions milder and improving chemical reaction efficiency.
In nature, substances exist in solid state, liquid state and gaseous state. Among them, solid particles are closely bound together, followed by liquid state, and gaseous state is dispersed. To achieve the transformation of substances from a dense to a dispersed aggregate state, it is necessary to provide additional energy to destroy the larger binding energy between the original particles. In the same way, when the substance is in a gaseous state, it continues to provide energy to form the ionization of the gaseous substance particles to form a plasma.
The difference between a low temperature plasma and a high temperature plasma is the temperature of the ions and the ion channel. The electron motion temperature of low temperature plasma is as high as 10~10K, while the ion and neutral ion temperature of gas is close to the ambient temperature, which is much lower than the electron motion temperature. Therefore, low temperature plasma is also called non-equilibrium plasma. Low temperature plasma can be generated under normal temperature and pressure, and its industrial application prospect is broad.
The test data shows that the power parameters have a great influence on the primary conversion rate of STC. The lower the power frequency and the higher the voltage within a certain range, the more conducive to the chlorosilane hydrogenation reaction. The low-temperature plasma generator generated by the power frequency through the DBD discharge method is safe, reliable, economical, environmentally friendly and easy to implement. For the promotion effect in the hydrogenation of silicon tetrachloride, the primary conversion efficiency of STC of more than 5% can be achieved by using plasma assistance under normal temperature and pressure conditions.
Plasma contains a large number of photons, electrons, ions, free radicals, and active atomic excited state atomic excited state molecules and active molecules, etc., which provide extremely active active particles for chemical reactions, so that many usually cannot occur or require extremely harsh conditions to occur. The chemical reaction becomes easy to carry out at close to room temperature, which provides a new realization method for chemical reaction. For the polysilicon chemical industry, considering hydrogenation, vapor deposition and other processes in terms of energy consumption control and efficiency improvement, the use of plasma to promote the reaction process has great practical value and scientific research value.
- Categories:Industry News
- Author:Plasma cleaning machine-CRF plasma plasma equipment-plasma surface treatment machine manufacturer-chengfeng intelligent manufacturing
- Origin:
- Time of issue:2022-03-08 10:20
- Views:
Research on the application of low temperature plasma radical chemical reaction in polysilicon industry:
A chemical reaction is a recombination at the level of atoms or groups of atoms, which requires the necessary activation energy for the reaction from the outside world. Compared with plasma, the reactants produced in industry are mostly in a dense condensed state. Most of the participating gases are dense layers of "high concentration", which makes it difficult to continuously transfer large excitation energy to the reaction system, and some chemical reactions that require extremely large activation energy are difficult to achieve under conventional technical conditions.
There is a close connection between chemistry and physics. Microscopic forms such as electron movement, interatomic interaction force, and excitation and ionization of atoms and molecules in molecules determine the physicochemical properties and chemical reaction capabilities of substances. Therefore, applying physical methods to change the state of matter can lead to chemical changes or affect the progress of chemical reactions.
For this reason, the electric field directly transfers energy to the gas molecules in the reaction chamber, generating electrons with sufficient energy to inelastically collide with the gas molecules, transferring almost all the energy of the electrons to the gas molecules participating in the reaction, so that a large number of photons are generated in the gas in the reaction chamber. , electrons, ions, free radicals and active atoms excited state atoms and active molecules provide extremely active active particles for their chemical reactions, thereby making many chemical reaction conditions milder and improving chemical reaction efficiency.
In nature, substances exist in solid state, liquid state and gaseous state. Among them, solid particles are closely bound together, followed by liquid state, and gaseous state is dispersed. To achieve the transformation of substances from a dense to a dispersed aggregate state, it is necessary to provide additional energy to destroy the larger binding energy between the original particles. In the same way, when the substance is in a gaseous state, it continues to provide energy to form the ionization of the gaseous substance particles to form a plasma.
The difference between a low temperature plasma and a high temperature plasma is the temperature of the ions and the ion channel. The electron motion temperature of low temperature plasma is as high as 10~10K, while the ion and neutral ion temperature of gas is close to the ambient temperature, which is much lower than the electron motion temperature. Therefore, low temperature plasma is also called non-equilibrium plasma. Low temperature plasma can be generated under normal temperature and pressure, and its industrial application prospect is broad.
The test data shows that the power parameters have a great influence on the primary conversion rate of STC. The lower the power frequency and the higher the voltage within a certain range, the more conducive to the chlorosilane hydrogenation reaction. The low-temperature plasma generator generated by the power frequency through the DBD discharge method is safe, reliable, economical, environmentally friendly and easy to implement. For the promotion effect in the hydrogenation of silicon tetrachloride, the primary conversion efficiency of STC of more than 5% can be achieved by using plasma assistance under normal temperature and pressure conditions.
Plasma contains a large number of photons, electrons, ions, free radicals, and active atomic excited state atomic excited state molecules and active molecules, etc., which provide extremely active active particles for chemical reactions, so that many usually cannot occur or require extremely harsh conditions to occur. The chemical reaction becomes easy to carry out at close to room temperature, which provides a new realization method for chemical reaction. For the polysilicon chemical industry, considering hydrogenation, vapor deposition and other processes in terms of energy consumption control and efficiency improvement, the use of plasma to promote the reaction process has great practical value and scientific research value.
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