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What is a plasma cleaner machine
- Categories:Technical Support
- Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
- Origin:
- Time of issue:2020-08-13
- Views:
(Summary description)Plasma cleaning machine, also known as plasma surface treatment machine, is a high-tech technology, the use of plasma to achieve conventional cleaning methods cannot achieve the results. Plasma cleaning is a dry cleaning method, which use gas phase chemical method to remove surface pollutants. The gas phase chemical method mainly includes thermal oxidation method and plasma cleaning method, etc. The cleaning process is to introduce the thermochemical gas or plasma reaction gas into the reaction chamber, and the reaction gas reacts with the wafer surface to generate volatile reaction products that are vacuum-pumped out.
What is a plasma cleaner machine
(Summary description)Plasma cleaning machine, also known as plasma surface treatment machine, is a high-tech technology, the use of plasma to achieve conventional cleaning methods cannot achieve the results.
Plasma cleaning is a dry cleaning method, which use gas phase chemical method to remove surface pollutants. The gas phase chemical method mainly includes thermal oxidation method and plasma cleaning method, etc. The cleaning process is to introduce the thermochemical gas or plasma reaction gas into the reaction chamber, and the reaction gas reacts with the wafer surface to generate volatile reaction products that are vacuum-pumped out.
- Categories:Technical Support
- Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
- Origin:
- Time of issue:2020-08-13 09:51
- Views:
What is a plasma cleaner machine:
Plasma cleaning machine, also known as plasma surface treatment machine, is a high-tech technology, the use of plasma to achieve conventional cleaning methods cannot achieve the results.
Plasma cleaning is a dry cleaning method, which use gas phase chemical method to remove surface pollutants. The gas phase chemical method mainly includes thermal oxidation method and plasma cleaning method, etc. The cleaning process is to introduce the thermochemical gas or plasma reaction gas into the reaction chamber, and the reaction gas reacts with the wafer surface to generate volatile reaction products that are vacuum-pumped out.
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