Application of COGLCD Plasma Cleaning Machine in COG-LCD Production Process

• Categories:Technical Support
• Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
• Origin:
• Time of issue:2021-03-17
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(Summary description)The COG assembly production process of liquid crystal display is to paste the naked IC on the ITO glass, and make the pins on the ITO glass and the pins on the IC connect and conduct by using the compression and deformation effect of the golden ball. With the continuous development of fine line technology, Pitch 20μm, 10μm products have been developed. As the surface cleanliness of ITO glass is required to be very high, the weldability of ITO glass is required to be very high. It must be soldered firmly, and no organic or inorganic substances can be left on the surface to prevent conduction between ITO glass electrode and IC Bump. Therefore, the cleaning of ITO glass is very important. In the current ITO glass cleaning process, the application of COG-LCD production process, we are trying to use a variety of cleaning agents (alcohol cleaning, ultrasonic cleaning) to clean the glass, but due to the introduction of cleaning agents, will cause other related problems due to the introduction, therefore, to explore a new cleaning method has become the direction of the manufacturers. It is an effective cleaning method to use COGLCD plasma cleaning machine to clean the surface of ITO glass step by step. In the plasma cleaning process of liquid crystal glass, the activation gas used is oxygen plasma, which can remove oil dirt and organic pollutant particles, because oxygen plasma can oxidize organic matter and form gas emissions. The need to pay attention to the problem is that after removing particles, need to add a device in addition to static electricity, the cleaning process: ejection - oxygen plasma - eliminate static electricity. After the dry cleaning process of LCD and its electrode terminal ITO, the cleanliness and adhesion have been greatly improved. The cleaning procedure is as follows: 1. Equipment: COGLCD plasma cleaning machine; Gas: Oil-free air drying. 2. Put 20PCS IC Bump on (stick to the yellow tape) and use Plasma for cleaning. Then heat treat the IC on the LCD after normal heat treatment. 3. Display the unsealed silica gel products on the product with 23PCS, conduct Plasma cleaning, and then detect and observe the display of the white strip. 4. Take 2pcs of products with OK display, 1pcs of ITO exposed in the same position will be stained with sweat (without gloves, directly wear finger cover, after about 15 minutes, the finger cover will be stained with sweat), and then power on the products together to observe the corrosion situation (workshop temperature control range: 22℃+/-6℃, humidity control range: 55%+/-15%). Plasma cleaning of product A; Product B was not cleaned. After continuous energized (200 hours) test, the results are as follows: product A has one missing line when energized for 71.5h, and the second missing line when energized for 77H; However, product B showed four lines missing when it was powered on for 4.5h. From the above experimental data, it can be seen that: 1. Plasma cleaning has no adverse effect on the product; 2. Plasma can clean the trace conductive dirt on the surface of ITO and improve the white strip phenomenon caused by leakage; 3. COGLCD plasma cleaning machine plasma cleaning can reduce the corrosion speed and corrosion degree of contaminated products. According to the above principle analysis and experimental data, the plasma cleaning machine can be used to clean liquid crystal glass and COG-LCD semi-finished glass assembly production process, in order to improve product quality and stability.