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The plasma processor has been used for many years. Do you understand the cleaning of the plasma processor

  • Categories:Technical Support
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2021-03-12
  • Views:

(Summary description)Plasma is a state of being of matter, usually in three states: solid, liquid, and gas, but in some special cases, it may also exist in a fourth state, for example, material from the surface of the sun, and material from the ionosphere of the earth's atmosphere. This kind of material in the state is called the plasma state, which is the fourth state of matter, said so much do not know whether to have a general understanding of the plasma in the plasma processor cleaning. The technology of plasma processor, which originated in the early 20th century, has been used more and more widely with the rapid development of high and new technology. The cleaning of plasma processor mainly relies on the "activation effect" of active particles in plasma to achieve the purpose of removing stains on the surface of objects. In terms of mechanism, plasma cleaning generally includes the following processes: inorganic gases are excited in plasma state; Gas phase material adsorbed on solid surface; Adsorptive groups react with solid surface molecules to form product molecules; The gas phase is formed by molecular resolution of the product. Reaction residue off the surface. Plasma processor cleaning technology is characterized by both process base material type of object, all can handle, for metal, semiconductor and oxides and most of the polymer materials, such as polypropylene, polyester, polyimide, poly (ethyl chloride, epoxy, ptfe, even can handle very well, and can be comprehensive, localized, and cleaning of complex structure. With the development of science and technology, the more sophisticated the better the various equipment, the higher the requirements for cleaning, especially in the chip manufacturing, image and display and other fields, such as mobile phone camera, chip, capacitor screen, flexible screen, etc., the higher the requirements for the cleaning of trace pollutants on the surface, even can not remain nanometer particles. Because the volume of pollutants is small and the composition is complex, the general surface requirements will not have organic residues, which can better reflect the role of the plasma processor cleaning machine. The plasma generated by the plasma processor cleaning machine can break the molecular chain of organic pollutants, so that the elements in the molecular structure are separated from the matrix, the separated elements react with the free radicals in the plasma, and the molecules are reorganized to form harmless gas emissions, so as to realize the surface cleaning.

The plasma processor has been used for many years. Do you understand the cleaning of the plasma processor

(Summary description)Plasma is a state of being of matter, usually in three states: solid, liquid, and gas, but in some special cases, it may also exist in a fourth state, for example, material from the surface of the sun, and material from the ionosphere of the earth's atmosphere. This kind of material in the state is called the plasma state, which is the fourth state of matter, said so much do not know whether to have a general understanding of the plasma in the plasma processor cleaning.
The technology of plasma processor, which originated in the early 20th century, has been used more and more widely with the rapid development of high and new technology. The cleaning of plasma processor mainly relies on the "activation effect" of active particles in plasma to achieve the purpose of removing stains on the surface of objects. In terms of mechanism, plasma cleaning generally includes the following processes: inorganic gases are excited in plasma state; Gas phase material adsorbed on solid surface; Adsorptive groups react with solid surface molecules to form product molecules; The gas phase is formed by molecular resolution of the product. Reaction residue off the surface.


Plasma processor cleaning technology is characterized by both process base material type of object, all can handle, for metal, semiconductor and oxides and most of the polymer materials, such as polypropylene, polyester, polyimide, poly (ethyl chloride, epoxy, ptfe, even can handle very well, and can be comprehensive, localized, and cleaning of complex structure.


With the development of science and technology, the more sophisticated the better the various equipment, the higher the requirements for cleaning, especially in the chip manufacturing, image and display and other fields, such as mobile phone camera, chip, capacitor screen, flexible screen, etc., the higher the requirements for the cleaning of trace pollutants on the surface, even can not remain nanometer particles. Because the volume of pollutants is small and the composition is complex, the general surface requirements will not have organic residues, which can better reflect the role of the plasma processor cleaning machine. The plasma generated by the plasma processor cleaning machine can break the molecular chain of organic pollutants, so that the elements in the molecular structure are separated from the matrix, the separated elements react with the free radicals in the plasma, and the molecules are reorganized to form harmless gas emissions, so as to realize the surface cleaning.

  • Categories:Technical Support
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2021-03-12 09:21
  • Views:
Information

The plasma processor has been used for many years. Do you understand the cleaning of the plasma processor?
Plasma is a state of being of matter, usually in three states: solid, liquid, and gas, but in some special cases, it may also exist in a fourth state, for example, material from the surface of the sun, and material from the ionosphere of the earth's atmosphere. This kind of material in the state is called the plasma state, which is the fourth state of matter, said so much do not know whether to have a general understanding of the plasma in the plasma processor cleaning.
The technology of plasma processor, which originated in the early 20th century, has been used more and more widely with the rapid development of high and new technology. The cleaning of plasma processor mainly relies on the "activation effect" of active particles in plasma to achieve the purpose of removing stains on the surface of objects. In terms of mechanism, plasma cleaning generally includes the following processes: inorganic gases are excited in plasma state; Gas phase material adsorbed on solid surface; Adsorptive groups react with solid surface molecules to form product molecules; The gas phase is formed by molecular resolution of the product. Reaction residue off the surface.

CRF plasma processor
Plasma processor cleaning technology is characterized by both process base material type of object, all can handle, for metal, semiconductor and oxides and most of the polymer materials, such as polypropylene, polyester, polyimide, poly (ethyl chloride, epoxy, ptfe, even can handle very well, and can be comprehensive, localized, and cleaning of complex structure.


With the development of science and technology, the more sophisticated the better the various equipment, the higher the requirements for cleaning, especially in the chip manufacturing, image and display and other fields, such as mobile phone camera, chip, capacitor screen, flexible screen, etc., the higher the requirements for the cleaning of trace pollutants on the surface, even can not remain nanometer particles. Because the volume of pollutants is small and the composition is complex, the general surface requirements will not have organic residues, which can better reflect the role of the plasma processor cleaning machine. The plasma generated by the plasma processor cleaning machine can break the molecular chain of organic pollutants, so that the elements in the molecular structure are separated from the matrix, the separated elements react with the free radicals in the plasma, and the molecules are reorganized to form harmless gas emissions, so as to realize the surface cleaning.

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