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Plasma film deposition technology

  • Categories:Company Dynamics
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2020-11-24
  • Views:

(Summary description)Plasma polymerization medium film can protect electronic components, using plasma deposition conductive film technology to protect electronic circuits and equipment from damage caused by static charge accumulation, plasma deposition film technology can also be used to make capacitor components. It can be widely used in electronic industry, chemical industry, optics and other fields.   Plasma volume silicon compound, SiOxHy is produced using SiH4+N2O(or Si(OC2H4)+O2). The air pressure is 1~5 ttos (1 ttos ≈133 pa) and the power is 13.5MHz. SiH4+SiH3+N2 was used for Si3N4 deposition at 300℃ and the deposition rate was 180 angm/min. The amorphous silicon carbide film is obtained SixC1+x: H by adding a carbon containing co-reactant silane, and x is Si/Si+C ratio. Hardness over 2500 kg/mm.   The selective osmosis and reverse osmosis membranes are prepared by depositing a thin polymer film on a porous substrate by plasma, which can be used to separate gases in the mixture, ions and water. It can also be combined with ultra-thin film layer to adapt to different selectivity, such as molecular size, solubility, ionic affinity, diffusivity, etc. In the conventional method, 0.5 mm film was deposited on the carbonate - silicon copolymer substrate, the permeation ratio of hydrogen to methane was 0.85, and the permeability of methane was higher than that of hydrogen. When the plasma deposited benzoyl cyanide monomer on the substrate, the ratio increased to 33, and the separation efficiency was greatly improved. Reverse osmosis membrane can be used for desalting seawater. When the water flow rate is lower than a certain threshold, the desalting effect is better. The polymer film has good permeability resistance, such as olefins, heterologous aromatics and aromatic amines.   The film prepared by plasma deposition technology can be used for optical elements, such as anti-reflection film, moisture-proof film, anti-wear film, etc. Plasma can be used in integrated optics to deposit a stable film according to the required refractive index and connect it to each element in the optical path. Such films lose 0.04 decibels of light per centimetre.

Plasma film deposition technology

(Summary description)Plasma polymerization medium film can protect electronic components, using plasma deposition conductive film technology to protect electronic circuits and equipment from damage caused by static charge accumulation, plasma deposition film technology can also be used to make capacitor components. It can be widely used in electronic industry, chemical industry, optics and other fields.

 

Plasma volume silicon compound, SiOxHy is produced using SiH4+N2O(or Si(OC2H4)+O2). The air pressure is 1~5 ttos (1 ttos ≈133 pa) and the power is 13.5MHz. SiH4+SiH3+N2 was used for Si3N4 deposition at 300℃ and the deposition rate was 180 angm/min. The amorphous silicon carbide film is obtained SixC1+x: H by adding a carbon containing co-reactant silane, and x is Si/Si+C ratio. Hardness over 2500 kg/mm.

 

The selective osmosis and reverse osmosis membranes are prepared by depositing a thin polymer film on a porous substrate by plasma, which can be used to separate gases in the mixture, ions and water. It can also be combined with ultra-thin film layer to adapt to different selectivity, such as molecular size, solubility, ionic affinity, diffusivity, etc. In the conventional method, 0.5 mm film was deposited on the carbonate - silicon copolymer substrate, the permeation ratio of hydrogen to methane was 0.85, and the permeability of methane was higher than that of hydrogen. When the plasma deposited benzoyl cyanide monomer on the substrate, the ratio increased to 33, and the separation efficiency was greatly improved. Reverse osmosis membrane can be used for desalting seawater. When the water flow rate is lower than a certain threshold, the desalting effect is better. The polymer film has good permeability resistance, such as olefins, heterologous aromatics and aromatic amines.

 

The film prepared by plasma deposition technology can be used for optical elements, such as anti-reflection film, moisture-proof film, anti-wear film, etc. Plasma can be used in integrated optics to deposit a stable film according to the required refractive index and connect it to each element in the optical path. Such films lose 0.04 decibels of light per centimetre.


  • Categories:Company Dynamics
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2020-11-24 10:32
  • Views:
Information

Plasma film deposition technology:

 

Plasma polymerization medium film can protect electronic components, using plasma deposition conductive film technology to protect electronic circuits and equipment from damage caused by static charge accumulation, plasma deposition film technology can also be used to make capacitor components. It can be widely used in electronic industry, chemical industry, optics and other fields.

 

Plasma volume silicon compound, SiOxHy is produced using SiH4+N2O(or Si(OC2H4)+O2). The air pressure is 1~5 ttos (1 ttos ≈133 pa) and the power is 13.5MHz. SiH4+SiH3+N2 was used for Si3N4 deposition at 300℃ and the deposition rate was 180 angm/min. The amorphous silicon carbide film is obtained SixC1+x: H by adding a carbon containing co-reactant silane, and x is Si/Si+C ratio. Hardness over 2500 kg/mm.

 

The selective osmosis and reverse osmosis membranes are prepared by depositing a thin polymer film on a porous substrate by plasma, which can be used to separate gases in the mixture, ions and water. It can also be combined with ultra-thin film layer to adapt to different selectivity, such as molecular size, solubility, ionic affinity, diffusivity, etc. In the conventional method, 0.5 mm film was deposited on the carbonate - silicon copolymer substrate, the permeation ratio of hydrogen to methane was 0.85, and the permeability of methane was higher than that of hydrogen. When the plasma deposited benzoyl cyanide monomer on the substrate, the ratio increased to 33, and the separation efficiency was greatly improved. Reverse osmosis membrane can be used for desalting seawater. When the water flow rate is lower than a certain threshold, the desalting effect is better. The polymer film has good permeability resistance, such as olefins, heterologous aromatics and aromatic amines.

 

The film prepared by plasma deposition technology can be used for optical elements, such as anti-reflection film, moisture-proof film, anti-wear film, etc. Plasma can be used in integrated optics to deposit a stable film according to the required refractive index and connect it to each element in the optical path. Such films lose 0.04 decibels of light per centimetre.

Plasma film deposition technology

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