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Atmospheric pressure plasma cleaning ritualistic reaction process diagnosis technology

  • Categories:Technical Support
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2020-11-07
  • Views:

(Summary description)Atmospheric pressure plasma is an important technology for energy gas conversion, material preparation and surface modification, environmental protection and biomedicine. There are many process variables in plasma, such as plasma temperature, density, various active species, etc., which affect the interaction between plasma and reaction medium and determine the structure and properties of reaction products or materials. The plasma temperature, density and various active species depend on the macroscopic parameters and conditions of the plasma, such as pressure, power and gas flow rate. Therefore, the diagnosis of plasma process is helpful to obtain the micro-mechanism of plasma discharge, establish the correlation between plasma process parameters and the results of plasma reaction, and find the internal information between them, so as to realize the controllability of plasma process.   Cleaning instrument plasma diagnosis technology is divided into off-position technology and in-situ technology. The offsets technique involves the extraction of plasma samples from a plasma reactor, such as mass spectrometry and gas phase electron paramagnetic resonance. The in-situ technology of atmospheric pressure plasma cleaning instrument includes invasive and non-invasive diagnostic techniques: invasive diagnostic techniques disturb the plasma, such as probe technique; The perturbation of plasma by non-invasive diagnostic techniques, such as spectroscopic diagnostic techniques, can be ignored. In atmospheric pressure plasma, spectral diagnosis is a common diagnostic technique.   Spectroscopic diagnosis technology is an important means to diagnose the complex physical and chemical processes occurring in the plasma and to measure the plasma temperature. It has the advantages of simple operation, good selectivity, high sensitivity and accuracy and no interference to the plasma. Spectroscopic diagnostic techniques mainly include emission spectrometry, absorption spectrometry and laser induced fluorescence.   OES is a common method to monitor and diagnose plasma processes. The spectral features of the emission spectrum provide rich information about the chemical and physical processes in the plasma. By measuring the wavelength and intensity of the spectral lines, various ions and neutral groups in the plasma can be identified.   The emission spectrum of atmospheric pressure plasma cleaning instrument can be divided into linear spectrum, banded spectrum and continuous spectrum, which are mainly used in the diagnosis of plasma emission spectrum. The atomic spectrum is generally linear, for example, the spectrum of hydrogen atom is simple atomic spectrum, it has mutually independent spectrum, only one line in the visible region, namely the Balmer line, the brighter four lines are: Hα-656.28 nm,Hβ-486.13 nm,Hγ-434.05 nm, Hδ-410.18 nm.

Atmospheric pressure plasma cleaning ritualistic reaction process diagnosis technology

(Summary description)Atmospheric pressure plasma is an important technology for energy gas conversion, material preparation and surface modification, environmental protection and biomedicine. There are many process variables in plasma, such as plasma temperature, density, various active species, etc., which affect the interaction between plasma and reaction medium and determine the structure and properties of reaction products or materials. The plasma temperature, density and various active species depend on the macroscopic parameters and conditions of the plasma, such as pressure, power and gas flow rate. Therefore, the diagnosis of plasma process is helpful to obtain the micro-mechanism of plasma discharge, establish the correlation between plasma process parameters and the results of plasma reaction, and find the internal information between them, so as to realize the controllability of plasma process.

 

Cleaning instrument plasma diagnosis technology is divided into off-position technology and in-situ technology. The offsets technique involves the extraction of plasma samples from a plasma reactor, such as mass spectrometry and gas phase electron paramagnetic resonance. The in-situ technology of atmospheric pressure plasma cleaning instrument includes invasive and non-invasive diagnostic techniques: invasive diagnostic techniques disturb the plasma, such as probe technique; The perturbation of plasma by non-invasive diagnostic techniques, such as spectroscopic diagnostic techniques, can be ignored. In atmospheric pressure plasma, spectral diagnosis is a common diagnostic technique.

 

Spectroscopic diagnosis technology is an important means to diagnose the complex physical and chemical processes occurring in the plasma and to measure the plasma temperature. It has the advantages of simple operation, good selectivity, high sensitivity and accuracy and no interference to the plasma. Spectroscopic diagnostic techniques mainly include emission spectrometry, absorption spectrometry and laser induced fluorescence.

 

OES is a common method to monitor and diagnose plasma processes. The spectral features of the emission spectrum provide rich information about the chemical and physical processes in the plasma. By measuring the wavelength and intensity of the spectral lines, various ions and neutral groups in the plasma can be identified.

 

The emission spectrum of atmospheric pressure plasma cleaning instrument can be divided into linear spectrum, banded spectrum and continuous spectrum, which are mainly used in the diagnosis of plasma emission spectrum. The atomic spectrum is generally linear, for example, the spectrum of hydrogen atom is simple atomic spectrum, it has mutually independent spectrum, only one line in the visible region, namely the Balmer line, the brighter four lines are: Hα-656.28 nm,Hβ-486.13 nm,Hγ-434.05 nm, Hδ-410.18 nm.


  • Categories:Technical Support
  • Author:plasma cleaning machine-surface treatment equipment-CRF plasma machine-Sing Fung Intelligent Manufacturing
  • Origin:
  • Time of issue:2020-11-07 08:56
  • Views:
Information

Atmospheric pressure plasma cleaning ritualistic reaction process diagnosis technology:

 

Atmospheric pressure plasma is an important technology for energy gas conversion, material preparation and surface modification, environmental protection and biomedicine. There are many process variables in plasma, such as plasma temperature, density, various active species, etc., which affect the interaction between plasma and reaction medium and determine the structure and properties of reaction products or materials. The plasma temperature, density and various active species depend on the macroscopic parameters and conditions of the plasma, such as pressure, power and gas flow rate. Therefore, the diagnosis of plasma process is helpful to obtain the micro-mechanism of plasma discharge, establish the correlation between plasma process parameters and the results of plasma reaction, and find the internal information between them, so as to realize the controllability of plasma process.

 

Cleaning instrument plasma diagnosis technology is divided into off-position technology and in-situ technology. The offsets technique involves the extraction of plasma samples from a plasma reactor, such as mass spectrometry and gas phase electron paramagnetic resonance. The in-situ technology of atmospheric pressure plasma cleaning instrument includes invasive and non-invasive diagnostic techniques: invasive diagnostic techniques disturb the plasma, such as probe technique; The perturbation of plasma by non-invasive diagnostic techniques, such as spectroscopic diagnostic techniques, can be ignored. In atmospheric pressure plasma, spectral diagnosis is a common diagnostic technique.

 

Spectroscopic diagnosis technology is an important means to diagnose the complex physical and chemical processes occurring in the plasma and to measure the plasma temperature. It has the advantages of simple operation, good selectivity, high sensitivity and accuracy and no interference to the plasma. Spectroscopic diagnostic techniques mainly include emission spectrometry, absorption spectrometry and laser induced fluorescence.

 

OES is a common method to monitor and diagnose plasma processes. The spectral features of the emission spectrum provide rich information about the chemical and physical processes in the plasma. By measuring the wavelength and intensity of the spectral lines, various ions and neutral groups in the plasma can be identified.

 

The emission spectrum of atmospheric pressure plasma cleaning instrument can be divided into linear spectrum, banded spectrum and continuous spectrum, which are mainly used in the diagnosis of plasma emission spectrum. The atomic spectrum is generally linear, for example, the spectrum of hydrogen atom is simple atomic spectrum, it has mutually independent spectrum, only one line in the visible region, namely the Balmer line, the brighter four lines are: Hα-656.28 nm,Hβ-486.13 nm,Hγ-434.05 nm, Hδ-410.18 nm.

Atmospheric pressure plasma cleaning

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